正版新书]光学材料的表征/材料表征原版系列丛书(美)布伦德尔//

Preface to the Reissue ofthe Materials Characterization Series
Preface to Series
Preface to the Reissue of Characterization of Optical Materials
Preface
Contributors
INTRODUCTION 1
PARTⅠ：INFLUENCE OF SURFACEMORPHOLOGYAND MICROSTRUCTURE ON OPTICAL RESPONSE CHARACTERIZATION OF SURFACE ROUGHNESS
1.1 Introduction
1.2 What Surface Roughness Is
1.3 How Surface Roughness Affects Optical Measurements
1.4 How Surface Roughness and ScatteringAre Measured
1.5 Characterization of Selected Surfaces
1.6 Future Directions
CHARACTERIZATION OF THE NEAR—SURFACE REGION USING POIARIZATION—SENSITWE OPTICAL TECHNIQUES
2.1 Introduction
2.2 Ellipsometry
Experimental Implementations of Ellipsometry
Analysis of Ellipsometry Data
2.3 Microstructural Determinations from Ellipsometry Data
Temperarure Dependence of the Optical Properties ofSilicon
Determination ofthe Optical Functions ofGlasses Using SE
Spectroscopic Ellipsometry Studies of SiO2/Si
Spectroscopic Ellipsometry for Complicated Film Structures
Time—Resolved Ellipsometry
Single—Wavelength Real—Time Monitoring of Film Growth
Multiple—Wavelength Real—Time Monitoring of Film Growth
Infrared Ellipsometry Studies of Film Growth
THE COMPOSITION，STOICHIOMETRY AND RELATED MICROSTRUCTURE OF OPTICAL MATERIALS
3.1 Introduction
3.2 Aspects of Raman Scattering
3.3 Ⅲ—Ⅴ Semiconductor Systems
3.4 Group Ⅳ Materials
3.5 Amorphous and Microcrystalline Semiconductors
Chalcogenide Glasses
Group Ⅳ Microcrystalline Semiconductors
3.6 Summary
DIAMOND AS AN OPTICAL MATERIAL
4.1 Introduction
4.2 Deposition Methods
4.3 Optical Properties of CVD Diamond
4.4 Defectsin CVD Diamond
4.5 PolishingCVD Diamond
4.6 X—ray Window
4.7 Summary
PARTⅡ STABILITYANDMODIFICATION OF FILM AND SURFACE OPTICAL PROPERTIES
MULTIJAYER OPTICAL COATINGS
5.1 Introduction
5.2 Single—Layer Optical Coatings
Optical Constants
Composition Measurement Techniques
5.3 Multilayer Optical Coatings
Compositional Analysis
Surface Analytical Techniques
Microstructural Analysis of Multilayer Optical Coatings
5.4 Stability of Multilayer Optical Coatings
5.5 Future Compositional and
Microstructural Analytical Techniques
CHARACTERIZATION AND CONTROL OF STRESS IN OPTICAL FILMS
6.1 Introduction
6.2 OriginsofStress
6.3 Techniques for Modifying or Controlling Film Stress
Effect of Deposition Parameters
Effect of Ion—Assisted Deposition
Effect of Impurities
EffeaofPost Deposition Annealing
6.4 Stress Measurement Techniques
Substrate Deformation X—Ray Diffraction（XRD）
Raman Spectroscopy
6.5 Future Directions
SURFACE MODIFICATION OF OPTICAL MATERIALS
7.1 Introduction
7.2 Fundamental Processes
Ion—Solid Inreracrions
Defect Production，Rearrangement，and Retention
7.3 Ion Implantation of Some Optical Materials
Glasses andAmorphous Silica
α—Quarrz（SiO2）
Halides
Sapphire（α—Al2O3）
LiNbO3
Preparation of Optical Components by Ion Implantation
IASER—INDUCED DAMAGE TO OPTICAL MATERIALS
8.1 Introduction
8.2 Laser Damage Definition and Statistics
Defining Damage
Collecting Damage Statistical Data
Types of Damage Probability Distributions
Identification of Pre—DamageSites
Changing the Damage Threshold
8.3 In Situ Diagnostics
Photothermal Techniques
Particle Emission
8.4 Postmortem Diagnostics
Surface Charge State
Surface Phase and Structure Analysrs
8.5 Future Directions
APPENDIX：TECHNIQUE SUMMARIES
1 Auger Electron Spearoscopy（AES）
2 Cathodoluminescence（CL）
3 Electron Energy—Loss Spectroscopy in the Transmission Electron Microscope（EELS）
4 Energy—Dispersive X—Ray Spectroscopy（EDS）
5 Fourier Transform Infrared Spectroscopy（FTIR）
6 Light Microscopy
7 Modulation Spectroscopy
8 Nuclear Reaction Analysis（NRA）
9 Optical Scatterometry
10 Photoluminescence（PL）
11 Photothermal Displacement Technique
12 Raman Spectroscopy
13 Rutherford Backscattering Spectrometry（RBS）
14 Scanning Electron Microscopy（SEM）
15 Scanning Transmission Electron Microscopy（STEM）
16 Scanning Tunneling Microscopy and Scanning Force Microscopy（STM and SFM）
17 Static Secondary Ion Mass Spectrometry（Static SIMS）
18 Surface Roughness：Measurement，Formation by Sputtering，lmpact on Depth Profiling
19 Total Internal Reflection Microscopy
20 Transmission Elearon Microscopy（TEM）
21 Variable—Angle Spectroscopic Ellipsometry（VASE）
22 X—Ray Diffraction（XRD）
23 X—Ray Fluorescence（XRF）
24 X—Ray Photoelectron Spectroscopy（XPS）
Index

光学材料表征一书提供了关于在不同表征技术影响下理解光学材料的性能与特性方面的知识。表面与界面性质对材料的光响应是非常重要的，为实现所需性能在材料加工过程中对他们进行控制与修饰是必要的。《光学材料的表征》(作者布伦德尔、埃文斯、伊莎霍斯)一书集中介绍了表面形貌、微观结构及化学键是如何影响材料的光响应，它介绍了用于表征薄膜、多层结构与改性表面的方法。